Test Reticles

Since its founding in 1987, Benchmark Technologies’ core business has focused on test reticles. Over the years we have gone on to develop a wide range of test reticle products that have become industry standards. These include our Phase Shift Focus Monitor Reticle and Universal Matching Reticle, both of which leverage fab metrology tools coupled with Benchmark Technologies Software to provide engineers with comprehensive analytical opportunities. We also provide many other widely used standard test reticles for tool monitoring and process development. For more information on our standard test reticle products, please click the links labeled “learn more” below:

Phase Shift Focus Monitor™

High precision focus monitoring using a single wafer lot and offline overlay metrology. Suitable for 193nm Immersion, 193 Dry Immersion, 248nm and 365nm scanners and steppers.

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Universal Matching Reticle

Our universal matching reticle is the standard independent method for matching overlay on scanners and steppers.

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Resolution Test Reticle

The Lithographer’s toolbox contains many useful test patterns for evaluating lithography tool performance, materials and process development.

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Multi-Transmission Mask

Our contact aligner multi-transmission masks are used worldwide as a means of evaluating and setting the appropriate dose using a single wafer.

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Visual Diagnostic Reticles

These reticles provide quick and easy methods for assessing focus, tilt and other parameters with a quick visual comparison eliminating operator subjectivity of other methods.

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Custom Test Reticles

We leverage our broad patterning experience an knowledge of supply chain to develop custom reticles for a variety of applications in lithography and optics.

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