Benchmark's Visual Diagnostic Test Reticles are widely accepted and endorsed by both semiconductor manufacturers and equipment vendors, to rapidly determine stepper best focus without the use of a microscope. With these reticles, optimum focus can be found more quickly and with half the variability of conventional microscope linewidth measurement methods.

Additional Features and Benefits include:

• Reduce operator subjectivity
• Less variability resulting in tighter SPC control limits
• Optimize stepper utilization for reduced cost of ownership

Visual Diagnostic Test Reticles are used for measuring:

• Field Tilt
• Field Curvature
• Illumination Uniformity
• Wafer Chuck Effects
• Develop & Soft Bake Uniformity
• Dose Matching

Full Field Visual Diagnostic Test Reticle
Benchmark's Full Field Test Reticle is used to create a focus/exposure matrix with best focus at the center. As energy increases, resist test structures clear out at extreme focus positions of the matrix. The resulting image resembles a histogram plot with a peak indicating the best focus setting, that can aid in determining coating nonuniformity and identifying hot spots.

D-2 Test Reticle
Benchmark's D-2 Test Reticle is used to evaluate illumination uniformity, wafer chuck effects, development and soft bake uniformity, and dose matching.

D-3 Test Reticle
Benchmark's D-3 Test Reticle is used to determine dose matching, and to evaluate focal plane tilt, wafer leveling, and column alignment.

D-5 Test Reticle
Benchmark's D-5 Test Reticle is used to evaluate fixed dose (focus matrix only), and is suitable for a variety of NA's.

Contact Benchmark today to learn more about Visual Diagnostic Test Reticles.