Phase Shift Focus Monitor
0.18µm Optical Lithography Performances Using an Alternating DUV Phase Shift mask Y. Trouiller et al.
Characterization and Monitoring of Variable NA and Variable Coherence Capable Photo Steppers Utilizing the Phase Shift Focus Monitor Reticle E. Sherman, C. Harker
ASML 5500/100C Image Plane Investigation with Focus Monitor and Overlay Measurements M. Dusa, S. Dellarochetta, T. Zavecz
Characterization of Autofocus Uniformity and Precision on ASML Steppers Using the Phase Shift Focus Monitor Reticle R. Edwards, P. Ackmann, M. Desrocher, et al. (July 1997)
Detailed Study of a Phase Shift Focus Monitor C. Sager, B. DeWitt, G. Pugh
Evaluation of Phase-Edge Phase-Shifting Mask for Sub-0.18µm Gate Patterns in Logic Devices Dong-ho Cha, et al.
Focal
Plane Determination for Sub-Half Micron Optical Steppers C.
Sager, et al.
Phase Shift Focus Monitor Applications to Lithography Tool Control D. Wheeler, E. Soloecky, et al. (SPIE Vol. 3051-100, March 1997)
Narrow Pitch Contact Array Patterning Technique for Gbit DRAM by Using Multi-Phase-Shifting Mask T. Nakabayashi
Simulations
and Experiments with the Phase Shift Focus Monitor T.
Brunner, R. Mih
Litho Tool Matching
Advanced
Lithography T001-Matching Expands Technical Capabilities in Existing Fabs
F. Goodwin, et al. (Solid
State Technology, June 2000)
