Benchmark Technologies’
MEMS-Related Services

Introduction to MEMS/MOEMS

Microelectromechanical Systems (MEMS) is a technology that integrates complex electromechanical elements and processing circuitry on a silicon substrate.  This is accomplished using a combination of batch fabrication techniques that handles the electronics, similar to the way integrated circuits are made, and processes called “micromachining,” which forms the tiny mechanical devices.  The end result is a unique and self-contained system that not only detects its environment but also has the capability of actively changing it.

The MicroOptoElectroMechanical Systems (MOEMS) are MEMS with the ability to alter or modulate the path of a light beam; and in some cases, to temporally or spectrally modify the light beam. The most common micro-optical elements are those that reflect, diffract, or refract light.

Common MEMS examples include the ink-jet printer head, air bag sensor, pressure sensor, and optical switch.

MEMS MASK LAYOUT CHALLENGES
Traditional microprocessor circuits are generally laid out in an orthogonal grid pattern with rectangular/circular features.  A MEMS device may have complicated patterns such as spirals, jagged edges, and other structures.  Their features may also be laid diagonally, and they may extend beyond the boundaries of an exposure field that is used in traditional photolithography exposure tools.

This makes MEMS mask design more challenging and requires an in-depth understanding of mask making and chip making equipment and processes.

Benchmark Technologies is a premier supplier of reticles for the last fifteen years.  Our comprehensive line of photo-masks is used throughout the world by leading MEMS researchers and manufacturers. Our masks are currently being used in the fabrication of:

• Planar Light Circuits (PLC) for optical waveguides, optical switch, and optical modulator applications

• Sensors and Actuators for use in chemical, medical, aerospace, metrology, environmental monitor, and automotive applications

• RF-MEMS for microwave and other wireless applications

• Several MEMS customers are using contact printers.  Our Multitransmission Mask helps them set dose using a single exposure.

OUR MEMS-RELATED SERVICES
Benchmark Technologies’ strength lies in our understanding of photolithography equipment and processes.  We utilize this knowledge to design masks catering to your specific application and tool set needs.  Our turnaround time is a matter of days as opposed to the months that current MEMS device makers are taking to turn their designs into masks.  We have a long history of working with chip designers, mask manufacturers, and photolithography equipment manufacturers.  Our services include:

• Turnkey Mask Solution:

We address all your masking needs, from concept/rough draft to full reticle design and manufacturing.  We employ the latest mask design techniques and customize the mask for your tool set and application.  We do data conversion, verification, and correction on your designs to improve mask manufacturability.

• Rapid turn-around time:

We are committed to a rapid turn around.  We work with the mask shops on a daily basis and understand their needs and capabilities, as well as their systems.  The strong partnership between the mask shops and Benchmark can translate into a reduction in your turn around time from months to days.

 Contact us for more information.