Notching Test Reticles

Benchmark's Notching Test Reticle is typically used for both passes of a two-level process, to analyze the notching effect for varying degrees of overlap and gap sizes between topography and resist.

The Notching Test Reticle contains the following modules:

• Resolution targets, for rapid characterization of resist process
  
• Multi-Angle and 3ƒ Radial Posts and Lines, to provide quantitative evaluation of notching severity
  
• Notching Topography and Features, used to fabricate topography consisting of contacts, posts, lines and U-shaped structures of varying sizes
  
• Calibrated Box-in-Box Pattern, Used for calibrating metrology equipment for submicron overlay measurements
  
• Line/Space Ratio Test Structure, to evaluate proximity effects - minimum space printable between adjacent infinite lines. These provide 289 combinations of line/space pairs for evaluating process capability
  
• Contact Pads, used as resist flow structures for analysis of a resist curing process
  
  Contact Benchmark Technologies today to learn more about the Notching Test Reticles