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Benchmark Technologies and
its fabrication partner, Holographix LTD have
teamed up to provide a complete solution for delivering replicated nano
imprint templates. Leveraging Holographix’ proprietary polymer replication
technology and Benchmark Technologies’ broad experience in master patterning
fabrication strategies, this combination provides for a single interface for
pattern CAD, template layout, mastering and replication.
Imprint Templates
Imprint lithography has proven itself as a means for fabrication of
nanostructures and continues to be investigated and adopted for a wide
variety of applications including life sciences, data storage, opto-electronics
and semiconductor. The Benchmark-Holographix team provides a unique
combination of fabrication services to meet the growing needs of this
customer base. Our replicated templates provide a lower cost alternative and
reduce risk of damage associated with using the original template for
nanofabrication.
Master Fabrication
Benchmark Technologies can take your project from the concept stage through
design and layout and implement the right technology for realizing the ideal
master to feed the replication process.
We
have broad experience on advanced patterning and can provide access for our
customers to a variety of master fabrication technologies including:
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Silicon-based masters using 193nm scanner lithography
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Silicon-based masters using Gaussian e-beam lithography
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Quartz-based masters using shaped e-beam lithography
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Quartz-based masters using Gaussian e-beam lithography
Template Characteristics
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Feature resolution: <10 nanometers
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Maximum feature size: 100 microns
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Optical transmission: >99% from 420 nm to 2.2 µm
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Temperature range: -100C to 200º C
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Humidity range: 0 to 95% continuous
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Chemical resistance: impervious to degradation by solvent, acid, and
alkaline environments
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Available as polymer on glass for UV-NIL Applications
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