Benchmark Technologies’
Grayscale Photomask Technology

Benchmark has many years of designing / fabricating binary, half-tone gray scale photomasks. We use proprietary pixelization programs and sub-resolution pixel sizes, which have been proven to create shaped profiles in photoresist for a wide variety of applications.

Technical Specs:

• Uses standard chrome on quartz photomask materials, cost effective vs. special materials approach

• OD Range for 0 to 3.0

• Various mask sizes, up to 9 inches

• Pixel size on mask is optimized for the intended litho tool

• Number of Gray levels: dependent on feature width, desired profile shape and optimized pixel size

• Feature / Pattern / Layout sizes range from microns to inches

Here is our Grayscale Mask brochure.

Publication by research institute using our grayscale mask

• Christopher T. Derose, et al, "High Δn strip-loaded electro-optic polymer waveguide modulator with low insertion loss", Optics Express, Vol. 17, Issue 5, pp. 3316-3321, (a third party link)

or give us a call at    +1 781 246 3303