SEMICON Taiwan 2018

September 5-7, 2018   

Booth Number: To Be Announced

Taipei Nangang Exhibition Center, Taipei, Taiwan

SPIE Photomask Technology & EUV Lithography

September 17-20, 2018   

San Jose Convention Center


Benchmark is the world's leading independent supplier of test reticles for lithography systems. For 3 decades, our products have been used by wafer fabs and  fab equipment and materials suppliers to optimize and monitor lithography tool performance and processes.

Benchmark also provides conventional mask and reticle design services as a primary source or as a backup to our customers' internal capability. As part of this turnkey activity we also provide for mask and reticle manufacturing.

Benchmark can also provide many custom fabrication services that leverage our deep understanding of design layout and the exceptional patterning capability of semiconductor industry infrastructure. 

Find out more about us.



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